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Company History


When Photronics was founded in 1969, the semiconductor industry was still in its early stages. Today, the industry has led the technological revolution, making way for the Information Age. Over time Photronics has played an increasingly significant role in the industry's technological advancements, to the point where it is one of the world's leading suppliers of reticles and photomasks, and is positioned to deliver the solutions necessary to reach and surpass the next technological plateau.

 

1969

Photronic Labs, Inc. is founded in Danbury, Connecticut. 

1978

Responding to rapid growth, the Company relocates from Danbury to a larger facility in neighboring Brookfield, Connecticut. 

1982

The first electron beam lithography system, a MEBES I, is installed.

1985

A new 20,000 square foot building is added to the Brookfield campus to accommodate continuing expansion.

1987

An initial public offering is completed. The Company is listed on the NASDAQ under the symbol PLAB.

Production begins at its second manufacturing facility in Milpitas, California, making the Company the only photomask manufacturer with operations on both the East and West coast.

1989

The captive photomask manufacturing operations of Martin Marietta Corporation are acquired and integrated into the Brookfield, Connecticut facility.

1990

Photronic Labs, Inc. is renamed Photronics, Inc.  A second public equity offering is completed.

1991

The captive photomask manufacturing operations of Analog Devices are acquired.   A third public equity offering is completed.

1992

The captive photomask manufacturing operations and assets of Unisys Corporation are acquired.

1993

Photronics is recognized as a "National Blue Chip Enterprise" by the United States Chamber of Commerce.

Photronics acquires the independent photomask manufacturing operations of Toppan Printonics (formerly the Texas Instruments captive photomask shop), thereby establishing a major operating presence in the strategically important Southwestern U.S. market.

The captive photomask manufacturing assets of Raytheon Corporation are acquired.

1994

Ground is broken in Allen, Texas, a Dallas suburb, as construction begins on the Company's flagship facility. 

Independent photomask manufacturer Hoya Micro Mask in Sunnyvale, California is acquired. 

1995

Plans to begin manufacturing operations in Singapore are announced. This facility will position Photronics as the only independent photomask manufacturer in Southeast Asia.

A fourth public equity offering is completed.

Microphase Laboratories in Colorado Springs, Colorado is acquired.

Photronics enters the European photomask market with the acquisition of GEC Plessey Semiconductors' captive photomask operations. This facility represents the Company's first wholly-owned manufacturing site outside of North America.

1996

Photronics makes minority equity investment in P.K. Ltd, formerly ANAM S&T Photomask - a leading independent photomask manufacturer in Korea.

Integrated Device Technology enters into a dedicated photomask capacity agreement.

The photomask manufacturing operations of CSEM Litomask in Neuchatel, Switzerland are acquired, expanding the Company's European manufacturing network. 

Ground is broken in Manchester, England, the site of the Company's new state-of-the-art manufacturing facility and European headquarters. Operations will be relocated from their current location on the GEC Plessey Semiconductor campus in Oldham.

National Semiconductor signs guaranteed manufacturing capacity agreement with Photronics.

The Company's facility in Singapore, the only photomask manufacturing operation in Southeast Asia, begins production.

Photronics is named in Fortune Magazine's List of "100 Fastest Growing Companies."

1997

Photronics opens newly constructed photomask manufacturing facility in Manchester, UK - the first new facility constructed in Europe this decade.

Photronics acquires captive photomask manufacturing operations of Motorola in Mesa, Arizona.

Photronics receives research grant from U.S. Display Consortium for large-area photomask development.

Photronics signs reticle technology agreement with ASM Lithography guaranteeing ASML's access to advanced photomask manufacturing technology.

MZD, an independent photomask manufacturer in Dresden, Germany is acquired. This is the Company's third facility in Europe.

1998

Photronics becomes the first photomask supplier to join IMEC, a European-based, not-for-profit research consortium.

Photronics collaborates with SEMATECH's Delphi team, supplying them with 4x deep ultraviolet reticles that combine aggressive optical proximity correction and phase shift enhancements to resolve 100 nanometer features using a 248 nanometer light source.

1999

Photronics and IBM form the NGL Mask Center of Competency (MCOC).

2000

Photronics acquires a majority share of Precision Semiconductor Mask Corporate (PSMC), Taiwan's photomask technology leader. PSMC becomes a subsidiary of Photronics.

Photronics and Align-Rite International complete merger, creating one of the world's largest and fastest growing strategic photomask suppliers.  

2001

The Company's Sub-Wavelength Reticle SolutionsTM phase shift photomasks are employed as part of a joint development effort MIT Lincoln Laboratory under DARPA sponsorship that successfully demonstrated the ability to produce sub-100nm features using KrF(248nm) exposure technology.

Photronics enters into a multi-year supplier agreement with JENOPTIK Laser, Optik, Systeme GmbH for the production of special photomasks required to produce advanced binary optic products.

The Company becomes one of the founding members of the Advanced Reticle Center (ARC), a European research consortium formed to accelerate the development of advanced reticle manufacturing technologies.

Photronics acquires a controlling equity interest in PKL.

Photronics and Conexant Systems Inc. announce a strategic technology alliance and multi-year supply agreement and acquires Conexant's captive photomask shop.

2002

Photronics introduces CyberMaskTM, a proprietary software suite that facilitates a seamless interface with semiconductor manufacturers to receive and prepare integrated circuit design data for reticle manufacturing.

Photronics acquires an additional 28% interest in PKL Co., Ltd. in Korea (Kosdaq: PKL). As a result of this transaction, the Company now owns 78.8% of PKL.

Photronics is named one of "Connecticut's Fastest Growing Technology Companies" in Deloitte & Touche "Fast 50" program.

2004

Rochester Institute of Technology and Photronics partner to produce first demonstration of 45 nanometer node wafer imaging technology utilizing an immersion lithography system.

Photronics Korea Ltd. Receives "Samsung Supplier Award."

Analog Devices Presents Photronics with "Supplier Excellence Award."

2005

Photronics begins construction on new Flat Panel Display Mask Fabrication facility to expand FPD manufacturing infrastructure into Taiwan.

Photronics completes tender offer for shares of PK, Ltd. in Korea.

Photronics announces talks with Micron Technology Inc. to jointly develop 45nm reticle technologies. 

2006

Photronics Opens State-of-the-Art Flat Panel Display Manufacturing Facility in Taichung, Taiwan to Increasingly Serve Asia's Rapidly Growing Display Industry.

Photronics & Micron Technology form joint venture known as MP Mask Technology Center to develop and produce photomasks for leading-edge and next generation semiconductors.

Groundbreaking ceremonies held in Boise, Idaho for new state-of-the-art, wholly owned integrated circuit manufacturing facility named nanoFab.

Photronics named one of Connecticut's Fastest Growing Technology Companies in Deloitte's Technology "Fast 50."

2007

Photronics presented "Best Partner Award" by Samsung Electronics.

First production tools arrive for installation at nanoFab.

Photronics expands production capacity and adds G7.5 capability to Taichung, Taiwan Flat Panel Display manufacturing facility.

2008

nanoFab ships first production reticle.

Photronics receives Analog Devices "Supplier Excellence Award."

Photronics receives ST Microelectronics "Best Front-End Supplier Award."

2009

Photronics enters into new lease agreement for nanoFab and reduces debt by $30 million.

The Company completes a common stock and convertible notes offering raising net proceeds of $98 million.

Photronics named "Supplier of the Year" by Tower Jazz. 

2010

Photronics wins "Supplier Excellent Award" from Texas Instruments.

Photronics named "Supplier of the Year" by Fairchild Semiconductor.

Photronics Chief Operating Officer, Dr. S.H. Jeong, receives "Industrial Merit Award" from Korean government for contributions to Korea's semiconductor industry.


2011

Photronics completes $115 million 3.25% convertible senior note offering.

Photronics acquires $35.4 million aggregate principal amount of its outstanding 5.5% convertible notes.

Photronics named "Supplier of the Year" by Fairchild Semiconductor.

Photronics achieves record sales in fiscal year 2011.

2012

Photronics purchases U.S. nanoFab building from Micron Technology, Inc.

Photronics receives "Supplier Excellence Award" from Analog Devices, Inc.

Photronics named "Supplier of the Year" by Fairchild Semiconductor.