Novel mask inspection flow using Sensitivity Control Layers

Conventional photomask inspection techniques utilize global sensitivity for all inspected area in the die; SRAF and OPC features become the sensitivity-limiters, which can result in reduced visibility to defects of interest (DOI). We describe the implementation of Sensitivity Control Layer (SCL), a novel database inspection methodology for the KLA-Tencor TerascanHR platform. This methodology enables inspection at maximum sensitivity in critical die-areas via “layer definition” during job set-up and sensitivity management of the layers during inspection.

Author: Shad Hedges, Chin Le, Mark Eickhoff, Mark Wylie, Tim Simmons, Venu Vellanki, Jeff McMurran
Date: 2008-02-19
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