Rapid and precise monitor of reticle haze
Reticle Haze results from the deposition of a chemical residue of a reaction that is initiated by Deep Ultra Violet (DUV) or higher frequency actinic radiation. Haze can form on the backside of the reticle, on the chrome side and on the pellicle itself. The most commonly reported effect of haze is a gradual loss in transmission of the reticle that results in a need to increase the exposure-dose in order to maintain properly sized features. Since haze formation is non-uniform across the reticle, transmission loss results in an increase in the Across Chip Linewidth Variation (ACLV) that is accompanied by a corresponding reduction in the manufacturing process window2. Haze continues to grow as the reticle is exposed to additional low wavelength radiation through repeated use.
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