Photronics strongly supports a broad range of mature technology solutions down to 180nm wafer printing for a wide variety of photomask applications. These technologies remain in volume production today. Photronics has also built industry leading service strategies to help customers maximize returns while extending their use of incumbent lithography systems. All of our manufacturing facilities provide lithographic solutions from three standard product families: Reduction Photomasks; Ultratech 1X Photomasks; and Standard 1X Photomasks.

Reduction Photomasks

Ultratech 1X Photomasks

Standard 1X Photomasks

Photronics' Advanced Binary product family includes both e-beam and laser-based processes that deliver superior critical dimension uniformity for higher yielding and better performing devices. In applications where sub-wavelength printing using a traditional chrome on glass mask is required, Photronics' advanced binary processes are employed to minimize the effects of non-linear pattern transfer (or mask error enhancement factor) from the photomask to the wafer. The Advanced Binary product family currently includes NanoRange, our revolutionary laser-based dry etch process for photomasks with tightly controlled critical dimension range, and the electron-beam based UltraRes process for applications where pattern fidelity holds high priority.

NanoRange

UltraRes

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The world of semiconductor technology continues to advance rapidly. Keeping pace with this change by delivering the world's most advanced solutions is what sets Photronics apart from its competition.

To support robust manufacturing needs for the quickly ramping 130nm technology node and the rapidly developing 90nm node, Photronics delivers the Sub-Wavelength Reticle Solutions? (SRS?) product families: ePhase embedded attenuated phase shift masks, and tPhase alternating aperture phase shift masks. Leading-edge e-beam and laser patterning tools support these solution families, while our advanced resist and etch processes ensure that our customers can receive the CD uniformity, cycle time and volume production requirements they demand. Understanding that 65nm and 45nm node requirements are just around the corner, Photronics maintains a commitment to highly advanced research and development efforts to ensure that we stay at the forefront of technology's continuing advancement.

ePhase

tPhase

Phase masks are used in the manufacture of Fiber Bragg Gratings, a critical component for controlling wavelength selectivity and dispersion compensation in high performance optical networking. Photronics? patent-pending e-beam phase mask process technology makes the use of advanced electron beam solutions not only feasible, but sets the new standard for producing Fiber Bragg Gratings. e-Beam phase masks offer greater flexibility in mask design than traditional holographic lithography, permitting engineers to explore more creative uses of Fiber Bragg Gratings in photonics applications. Photronics? phase masks are already being employed by a select and growing group of the industry?s leading global customers.

FBG Phase Masks

Stitch-suppressed e-Beam Uniform Phase Masks

Songbird? Chirped Phase Masks