From our humble beginnings to global photomask technology leader, each achievement along the way led to the next. Through the support and trust of our customers, the dedication and expertise of our employees, and tremendous contributions from our partners and stakeholders, we have achieved significant milestones. Today, we are a global leader in reticles and photomask technologies and solutions. We thank everyone who has been part of our long and successful journey to get here. See our historical timeline below.
Photronic Labs, Inc., is founded in Danbury, CT.
Responding to rapid growth, the Company relocates from Danbury to a larger facility in neighboring Brookfield, CT.
The first electron-beam lithography system, a MEBES I, is installed.
A new 20,000-square-foot building is added to the Brookfield campus to accommodate continuing expansion.
An initial public offering is completed. The Company is listed on the NASDAQ under the symbol PLAB.
The captive photomask manufacturing operations of Martin Marietta Corporation are acquired and integrated into the Brookfield facility.
Photronic Labs, Inc., is renamed Photronics, Inc. A second public equity offering is completed.
The captive photomask manufacturing operations of Analog Devices are acquired. A third public equity offering is completed.
The captive photomask manufacturing operations and assets of Unisys Corporation are acquired.
Photronics acquires photomask operations of Toppan Printonics (formerly Texas Instruments photomask shop), and Raytheon Company.
Ground is broken in Allen, Texas, and independent photomask manufacturer Hoya Micro Mask, Inc., is acquired.
Plans to begin manufacturing operations in Singapore are announced. Acquisitions include Microphase Laboratories, Inc. and GEC Plessey Semiconductors’ captive photomask operations (first wholly owned manufacturing site outside of North America).
Photronics makes a minority equity investment in PK Ltd., entering Korea and flat panel display market. In Europe, the photomask manufacturing operations of CSEM Litomask in Neuchâtel, Switzerland, are acquired, and ground is broken in Manchester, England.
Photronics acquires the captive photomask manufacturing operations of Motorola in the US, and MZD, an independent photomask manufacturer in Dresden, Germany.
Photronics becomes the first photomask supplier to join IMEC, a Europe-based, not-for-profit research consortium.
Photronics and IBM form the Next Generation Lithography Mask Center of Competency (NGL-MCOC).
Photronics acquires a majority share of Taiwan-based Precision Semiconductor Mask Corporation (PSMC), and completes merger with Align-Rite International, Inc., creating one of the largest and fastest-growing strategic photomask suppliers.
With MIT Lincoln Laboratory, Photronics develops Sub-Wavelength Reticle SolutionsTM phase-shift photomasks that demonstrates ability to produce sub-100nm features. Photronics acquires Conexant’s captive photomask shop.
Photronics introduces CyberMaskTM, a proprietary software suite that facilitates a seamless interface with semiconductor manufacturers to receive and prepare integrated circuit design data for reticle manufacturing.
Rochester Institute of Technology and Photronics partner to produce the first demonstration of 45nm node wafer imaging technology utilizing an immersion lithography system.
Photronics begins construction on new flat panel display mask fabrication facility to expand FPD manufacturing infrastructure into Taiwan.
Photronics announces joint venture with Micron Technology (MP Mask Technology Center) to develop and produce leading-edge photomasks; and breaks ground on new state-of-the-art, wholly owned facility in Boise, ID.
Photronics expands production capacity and adds G7.5 capability to Taichung, Taiwan, flat panel display manufacturing facility.
Boise ships its first production reticle.
Photronics creates PDMC joint venture in Taiwan with Dai Nippon Printing to become largest merchant photomask supplier in strategically important Taiwan market.
Photronics promotes Dr. Peter Kirlin to chief executive officer. and enters into strategic supply and technology agreement with Micron Technology, Inc.
Photronics announces $160 million investment to build state-of-the-art IC manufacturing facility in Xiamen, China.
Photronics announces a $160 million investment to build state-of-the-art FPD manufacturing facility in Hefei, China.
Photronics forms second joint venture with Dai Nippon Printing, extending successful IC partnership that begin in Taiwan in 2014 to now include all sales, marketing, distribution and manufacturing in China, including the facility in Xiamen.
Photronics celebrates grand opening and ramps production of two China high-end manufacturing facilities.