At Photronics, we understand it takes close collaboration and knowledge of our customers technology to provide quality photomasks.
Our commitment to research and development efforts ensure that we stay at the forefront of photomask technology. Our leading-edge e-beam patterning and inspection tools, new resists and materials, and advanced development and dry-etch processes, ensure that you get critical dimension (CD) uniformity, overlay, and defect control, that advanced masks demand.
Through significant R&D investments, strategic partnerships and projects with select customers and universities, we maintain the technological expertise to satisfy your demands today and into the future.
