Product-Proven Binary Masks

Extend Your Legacy Tools

With solid roots in legacy technologies, our mature binary mask solutions support wafer printing needs down to 180nm, which are in volume production for a variety of photomask applications. This allows you to maximize ROI by extending the use of your incumbent lithography systems.


Solutions Where You Need Them

Our worldwide manufacturing facilities provide local solutions for: Reduction Reticles (primarily 4X and 5X), Ultratech 1X Reticles, and Standard 1X Photomasks; and a range of mask sizes from 3 inch to 9 inch. We also supply 1X masters and copies. Equipment sets are optimized for fast cycle time and low cost, without compromising quality.

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